Liquid antimony pentachloride as oxidant for robust oxidative chemical vapor deposition of poly(3,4-ethylenedioxythiophene) films

The oxidative chemical vapor deposition (oCVD) process is investigated to produce poly (3,4-ethylenedioxythiophene) (PEDOT) thin films on 10 cm diameter Si wafers, involving the SbCl5 liquid oxidant. Process/structure/properties correlations are thoroughly studied, including influence of SbCl5/EDOT ratio, substrate temperature (Tsub), total pressure and duration, thickness, composition, morphology, spatial uniformity films, their electrical conductivity optical transmittance. increases by decreasing oxidant/EDOT ratio increasing temperature. Such increase results in decrease deposited mass thickness. Films improved pressure. Operating at 75 Pa equal uniform thickness substrates located all over chamber, proving potential PEDOT-SbCl5 oCVD be scaled up larger surfaces. absence post rinsing allows developing a full dry process, which interest coat sensitive can thus implemented for processing devices requiring durable, transparent, conductive PEDOT particular field optoelectronics.